Titanium Dioxide Hole-Blocking Layer in Ultra-Thin-Film Crystalline Silicon Solar Cells

Titanium dioxide/silicon hole-blocking selective contact to enable double- heterojunction crystalline silicon-based solar cell

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Thin-film crystalline silicon solar cells

A photoelectric conversion efficiency of over 10% has been achieved in thin-film polycrystalline silicon solar cells which consists of a 2 μm thick layer of polycrystalline silicon with a very small grain size (microcrystalline silicon) formed by low-temperature plasma CVD. This has shown that if the recombination velocity at grain boundaries can be made very small, then it is not necessarily i...

Crystalline Silicon Thin Film Solar Cells

Thin-film Silicon Solar Cells

The simplest semiconductor junction that is used in solar cells for separating photogenerated charge carriers is the p-n junction, an interface between the p-type region and ntype region of one semiconductor. Therefore, the basic semiconductor property of a material, the possibility to vary its conductivity by doping, has to be demonstrated first before the material can be considered as a suita...

Epitaxial Thin Film Crystalline Silicon Solar Cells on low Cost Silicon Carriers

In order to substantially reduce the costs of present crystalline Si solar cells, the material consumption of highly pure Si in a typical solar cell structure should be reduced. Most of the crystalline Si material merely acts as a mechanical carrier for the solar cell device with most of the optical absorption taking place in the upper 30μm region. When special care is taken to maximize optical...